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Structural and Electrical Characterization of Heterostructures Suitable for Future Nanoscale CMOS Devices

dc.contributor.authorMyrberg, Tobiasen
dc.date.accessioned2008-08-11T10:25:20Z
dc.date.available2008-08-11T10:25:20Z
dc.date.issued2004en
dc.identifier.urihttp://hdl.handle.net/2077/16394
dc.titleStructural and Electrical Characterization of Heterostructures Suitable for Future Nanoscale CMOS Devicesen
dc.typeTexten
dc.type.svepDoctoral thesisen
dc.gup.originGöteborgs universitet/University of Gothenburgeng
dc.gup.departmentPhysics and Engineering Physicseng
dc.gup.departmentFysik och teknisk fysikswe
dc.gup.defenceplaceHörsal KB Kemigården 4 Chalmers kl. 10.00en
dc.gup.defencedate2004-12-16en
dc.gup.dissdbid6345en
dc.gup.dissdb-fakultetMNF


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